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Title: | Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD |
Author: | Fonrodona Turon, Marta Soler Vilamitjana, David Villar, Fernando Escarré i Palou, Jordi Asensi López, José Miguel Bertomeu i Balagueró, Joan Andreu i Batallé, Jordi |
Keywords: | Cèl·lules solars Silici Deposició química en fase vapor Energia solar Solar cells Silicon Chemical vapor deposition Solar energy |
Issue Date: | 2006 |
Publisher: | Elsevier B.V. |
Abstract: | Hot-Wire Chemical Vapor Deposition has led to microcrystalline silicon solar cell efficiencies similar to those obtained with Plasma Enhanced CVD. The light-induced degradation behavior of microcrystalline silicon solar cells critically depends on the properties of their active layer. In the regime close to the transition to amorphous growth (around 60% of amorphous volume fraction), cells incorporating an intrinsic layer with slightly higher crystalline fraction and [220] preferential orientation are stable after more than 7000 h of AM1.5 light soaking. On the contrary, solar cells whose intrinsic layer has a slightly lower crystalline fraction and random or [111] preferential orientation exhibit clear light-induced degradation effects. A revision of the efficiencies of Hot-Wire deposited microcrystalline silicon solar cells is presented and the potential efficiency of this technology is also evaluated. |
Note: | Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2005.07.146 |
It is part of: | Thin Solid Films, 2006, vol. 501, num. 1-2, p. 247-251 |
URI: | http://hdl.handle.net/2445/47300 |
Related resource: | http://dx.doi.org/10.1016/j.tsf.2005.07.146 |
ISSN: | 0040-6090 |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
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